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by John L. Sturtevant

eBook Advances in Resist Technology And Processing 22 (Proceedings of SPIE) download ISBN: 0819457337
Author: John L. Sturtevant
Publisher: Society of Photo Optical; illustrated edition edition (May 30, 2005)
Language: English
Pages: 1282
ePub: 1485 kb
Fb2: 1246 kb
Rating: 4.5
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Category: Engineering
Subcategory: Engineering

August 1989 · Proceedings of SPIE - The International Society for Optical Engineering.

Effect of Technology Factors on Corrosion Resistance of Cold-Rolled Reinforcing Bar. M Yu. E E Ambrazhey. August 1989 · Proceedings of SPIE - The International Society for Optical Engineering. Dry-film solder masks and dry-film primary imaging resists have been required, as a secondary function, to successfully cover and protect certain holes in printed circuit boards (PCB's) during processing. Tenting, as this covering/protection operation is called, is now becoming an important characteristic during product selection and use of dry-film products.

MICROLITHOGRAPHY 2004 22-27 FEBRUARY 2004. 12 Sessions, 141 Papers, 0 Presentations. Fundamental Resist Issues (Invited Papers) (2). Resist Material Issues in Immersion Lithography (5). 193-nm Materials (6). 157-nm Materials (6).

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Author: John L. Sturtevant.

Proceedings of SPIE is the conference record of the Society of Photo-Optical Instrumentation Engineers (SPIE). The first proceedings were published in 1963. Proceedings of SPIE is indexed and abstracted in: Astrophysics Data System. International Aerospace Abstracts. Index to Scientific & Technical Proceedings.

S Maharjan, J Arevalo, M Montes, FA González, T Solorio Y Kono, A Sekiguchi, Y Hirai, S Arasaki, K Hattori. Advances in Resist Technology and Processing XXII 5753, 912, 2005.

S Maharjan, J Arevalo, M Montes, FA González, T Solorio. Proceedings of the 15th Conference of the European Chapter of th. 2017. Unsupervised feature learning for content-based histopathology image retrieval. JA Vanegas, J Arevalo, FA González. 2014 12th International Workshop on Content-Based Multimedia Indexing (CBM. 2014. Y Kono, A Sekiguchi, Y Hirai, S Arasaki, K Hattori. В данный момент система не может выполнить эту операцию. Повторите попытку позднее.

Futatsuki, . Ohmi, . Nakamura, K. and Ohmi, . in Proceedings of the International Conference on Advanced Microelectronic Devices and Processing, p. 425, 994. 11. Kern, W. RCA Re. 31, p. 256, (1970). SPWCC 992. 13. Pourbaix, . Atlas of Electrochemical Equilibria in Aqueous Solutions, Pergamon Press, London (1966). 14. Levy, . Patruno, . Mouche, L. and Tardif, . in Proceedings of the Second International Symposium on Ultra-Clean Processing of Silicon Surfaces, p. 293, 1994.

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6. Marriott, . "High Resolution Positive Resist Developers: A Technique for Functional Evaluation and Process Optimization," SPIE Optical Microlithography II, 394, p. 144 (1983). 7. Oriel Corporation, Catalog of Optical Systems and Components, 1979, p. D-31. 8. Babu, S. V. and Srinivasan, . "Characterization of Positive Photoresist Performance," to be submitted to J. Imaging Tech. 9. Walker, E. IEEE Trans. De. ED-22, 464 (1975). 10. Oldham, W. Nandgaonkar, S. Neureuther, A. R. and O'Toole, .

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Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.